Etch, Develop, or Cleaning requires backside rinse!
The Back-Side Rinse injector, standard on all Laurell EDC™ systems, prevents chemical and vapor impingement from the front-side process. An open or BSR chuck is needed to conduct the rinse effectively and is fully adjustable to accomodate most wafer sizes.
Laurell has a long-standing reputation for leading the market, and the standardization on the need for back-side rinse is one of our proudest accomplishments.