Improve your process by controlling the exhaust
- Control exhaust in each step of your process
- Create the ideal atmosphere for repeatable thin film uniformity even if your exhaust source is not completely stable
- Some processes (particularly thin coatings) are very sensitive to even the smallest gas flow within the process chamber when drying
- You can now automatically control the application of exhaust as part of a process
- It is now possible to create a static or reduced flow condition then fully exhaust vapors before opening the process chamber
- A retrofit is available for nearly all Laurell spin processors