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Saturday, July 31, 2010 
 
  wet etch station, wet station, wafer etcher
click to enlarge

wet etch station, wet station, wafer etcher
deck view

wet etch station, wet station, wafer etcher
drawer view

wet etch station, wet station, wafer etcher
with optional hood

 
  • WS-1000M (Mini Station)
  • *All white polypropylene construction
  • Any Laurell Spin processor installed
  • Easy-access Nitrogen & DI spray guns
  • Need a larger size? - see our standard Station


GENERAL INFORMATION:

The LTC WS-1000M Series Mini Spin-Process Stations accommodate tighter spaces and smaller budgets. This simple station is distilled to the essence of what a true wet station must be.

Features:

  • All polypropylene construction (*Self-extinguishing available - see below)
  • Accommodates the installation of any Laurell spin processor
  • Perforated wet-deck (easily removable)
  • Wet plenum
  • Exhaust Plenum with gauge
  • Isolated component/drawer below for heaters, pumps, vessels...(drawer model shown)
  • Available without fume hood for more benign process requirements

Options:

  • Processor exhaust interlock and control (standard on some models)
  • Heating & insitu material stirring
  • Rinse to resistivity
  • Drain diverter(s)
  • Vacuum loading wand
  • Wafer cassette stand
  • Leak detection
  • Light towers

*Advanced materials available if required

Better
WS-1000M-CP5 - meets SEMI S93 specification for fire safety in clean room applications. CP5 meets UL 94 V-0 fire classification. It has an excellent balance of physical properties, chemical resistance and fire safety

Best
WS-1000M-CP7-D - a flame retardant polypropylene formulation who's flame retardant characteristics meet the most rigorous FMRC 4910 testing standards for most aspects of flame retardation, self-extinguishing characteristics and burn-through. This advanced material also meets or exceeds test standards for low smoke generation and minimal toxic by-products.

See our brochure


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